Plasma Enhanced CVD of Organosilicon Thin Films on Electrospun Polymer Nanofibers

Plasma Processes and Polymers

Volumn 12, Issue 11, 2015, Pages 1231-1243

  Kedroňová, Eva ^a   Zajíčková, Lenka ^a   Hegemann, Dirk ^b   Klíma, Miloš ^a   Michlíček, Miroslav ^a   Manakhov, Anton ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

nanostructures; organosilicon precursors; plasma treatment; surface modification; water contact angle (WCA)

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; COLD WORKING; CONTACT ANGLE; ELECTRIC DISCHARGES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOFIBERS; NANOSTRUCTURES; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMER FILMS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT;

CHEMICAL COMPOSITIONS; ELECTROSPUN NANOFIBERS; ELECTROSPUN POLYMER NANOFIBERS; ORGANO-SILICON PRECURSOR; ORGANOSILICON THIN FILMS; PLASMA TREATMENT; RADIO FREQUENCY DISCHARGES; WATER CONTACT ANGLE (WCA);

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84955211223     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201400235     Document Type: Article

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