Thin film deposition on open-cell foams by atmospheric pressure dielectric barrier discharges

Plasma Processes and Polymers

Volumn 13, Issue 4, 2016, Pages 470-479

  Fanelli, Fiorenza ^a   Fracassi, Francesco ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

dielectric barrier discharges (DBD); fluoropolymers; plasma enhanced chemical vapor deposition (PECVD); polyurethane foam

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; COATINGS; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; ELECTRIC REACTORS; FLUORINE CONTAINING POLYMERS; PLASMA APPLICATIONS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; POLYURETHANES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; DIELECTRIC BARRIER DISCHARGES; EXPERIMENTAL CONDITIONS; INTERCONNECTED POROUS STRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); POLYURETHANE FOAM; SURFACE CHEMICAL COMPOSITION; THREEDIMENSIONAL (3-D);

DIELECTRIC DEVICES;

EID: 84947967727     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201500150     Document Type: Article

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