Electrical and optical properties of AC microdischarges in porous ceramics

Plasma Processes and Polymers

Volumn 4, Issue 7-8, 2007, Pages 682-693

  Hensel, Karol ^a   Martišovitš, Viktor ^a   Machala, Zdenko ^a   Janda, Mário ^a   Leštinský, Michal ^a   Tardiveau, Pierre ^b   Mizuno, Akira ^c  

^a Faculty of Natural Sciences   (Slovakia)

^b UNIVERSITÉ PARIS SUD   (France)

^c TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

AC barrier discharges; Microdischarges; Optical emission; Porous ceramics

Indexed keywords

CERAMIC MATERIALS; ELECTRIC PROPERTIES; LIGHT EMISSION; OPTICAL PROPERTIES; PORE SIZE; POROUS MATERIALS;

AC BARRIER DISCHARGES; MICRODISCHARGES; OPTICAL EMISSION; POROUS CERAMICS;

ELECTRIC DISCHARGES;

EID: 35548968421     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200700022     Document Type: Conference Paper

References (28)

1. T. Oda, T. Kato, T. Takahashi, K. Shimizu, IEEE Trans. Ind. Appl. 1998, 34, 268.
2. T. Yamamoto, M. Okubo, T. Nagaoka, K. Hayakawa, IEEE Trans. Ind. Appl. 2002, 38, 1168.
3. H.-H. Kim, G. Prieto, K. Takashima, S. Katsura, A. Mizuno, J. Electrostat. 2002, 55, 25.
4. T. Hammer, Plasma Sources Sci. Technol. 2002, 11, 1.
5. F. Holzer, U. Roland, F.-D. Kopinke, Appl. Catal. B: Environ. 2002, 38, 163.
6. H.-H. Kim, Plasma Process. Polym. 2004, 1, 91.
7. B. M. Penetrante, M. C. Hsiao, J. N. Bardsley, Plasma Sources Sci. Technol. 1997, 6, 251.
8. M. Kraus, B. Eliasson, U. Kogelschatz, A. Wokaun, Chem. Phys. Chem. 2001, 3, 294.
9. N. Blin-Simiand, P. Tardiveau, A. Risacher, F. Jorand, S. Pasquiers, Plasma Process. Polym. 2005, 2, 256.
10. N. Jidenko, M. Petit, J.-P. Borra, J. Phys. D: Appl. Phys. 2006, 39, 281.
11. K. Hensel, S. Katsura, A. Mizuno, IEEE Trans. Plasma Sci. 2005, 33, 574.
12. K. Hensel, Y. Matsui, S. Katsura, A. Mizuno, Czech. J. Phys. 2004, 54, C683.
13. J. Sawada, Y. Matsui, K. Hensel, I. Koyamoto, K. Takashima, S. Katsura, A. Mizuno, Proc. Int. Conf. Appl. Electrostat. 2004, 5, 128.
14. C. O. Laux, T. G. Spence, C. H. Kruger, R. N. Zare, Plasma Sources Sci. Technol. 2003, 12, 125.
15. A. Mizuno, IEEE Trans. Dielec. Electr. Insul. 2000, 7, 615.
16. A. Jaworek, A. Krupa, T. Czech, J. Phys. D: Appl. Phys. 1996, 29, 2439.
17. K. H. Becker, K. H. Schoenbach, J. G. Eden, J. Phys. D: App. Phys. 2006, 39, R55.
18. K. H. Becker, U. Kogelschatz, K. H. Schoenbach, R. J. Barker, " Non-Equilibrium Air Plasmas at Atmospheric Pressure", Institute of Physics Publishing, Bristol 2005.
19. M. Wegener, W. Wirges, J. Fohlmeister, B. Tiersch, R. Gerhard-Multhaupt, J. Phys. D: Appl. Phys. 2004, 37, 623.
20. A. Mellinger, PhD Thesis, University of Potsdam, 2004.
21. M. J. Kushner, J. Appl. Phys. 2004, 95, 846.
22. M. J. Kushner, J. Phys. D: Appl. Phys. 2005, 38, 1633.
23. L. G. H. Huxley, B. W. Crompton, "The Diffusion and Drift of Electrons in Gases", Wiley-Interscience, New York 1974.
24. S. C. Brown, "Basic Data of Plasma Physics", Wiley-Interscience, New York 1959.
25. V. L. Granovskiy, "Electric Current in Gas" (in Russian), Nauka, Moscow 1971.
26. B. M. Smirnov, "Ions and Excited Atoms in a Plasma" (in Russian), Atomizdat, Moscow 1974.
27. J.-P. Borra, J. Phys. D: Appl. Phys. 2006, 39, R19.
28. T. Yamamoto, B. W. L. Jang, IEEE Trans. Ind. Appl. 1999, 35, 736.