Crystalline-Amorphous Silicon Nanocomposites with Reduced Thermal Conductivity for Bulk Thermoelectrics

ACS Applied Materials and Interfaces

Volumn 7, Issue 24, 2015, Pages 13484-13489

  Miura, Asuka ^a   Zhou, Shu ^b   Nozaki, Tomohiro ^b   Shiomi, Junichiro ^a,c  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

nanostructure; plasma activated sintering; plasma enhanced chemical vapor deposition; silicon; thermal conductivity; thermoelectric material

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; ELECTRIC POWER FACTOR; NANOSTRUCTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR QUANTUM DOTS; SILICON; SILICON OXIDES; SINTERING; THERMAL CONDUCTIVITY; THERMOELECTRIC EQUIPMENT; THERMOELECTRICITY;

CRYSTALLINE SILICONS; DOPING CONCENTRATION; NANOSTRUCTURED BULK; PLASMA ACTIVATED SINTERING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); SILICON NANOCOMPOSITES; THERMO-ELECTRIC MATERIALS; WIDE TEMPERATURE RANGES;

AMORPHOUS SILICON;

EID: 84932651564     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b02537     Document Type: Article

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