Programming matter through strain

Extreme Mechanics Letters

Volumn 3, Issue , 2015, Pages 8-16

  Motala, Michael J ^a,b   Perlitz, Daniel ^a   Daly, Christopher M ^a,b   Yuan, Peixi ^a,b   Nuzzo, Ralph G ^a,b   Hsia, K Jimmy ^a,b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b United States of America   (United States)

Author keywords

Mesoscale self assembly; PDMS; Programmable matter; Strain gradients; SU 8

Indexed keywords

BIOMIMETICS; LIGHT SCATTERING; MECHANICS; MECHANISMS; MICROCHANNELS; PHOTORESISTS; POLYDIMETHYLSILOXANE; PULSE WIDTH MODULATION; SELF ASSEMBLY; SILICONES; SOLVENTS;

CROSS-LINK DENSITIES; FABRICATION PARAMETERS; FINITE ELEMENT SIMULATIONS; MESOSCALE; POLYDIMETHYLSILOXANE PDMS; PROGRAMMABLE MATTER; STRAIN GRADIENTS; SU-8;

SWELLING;

EID: 84930195730     PISSN: None     EISSN: 23524316     Source Type: Journal    
DOI: 10.1016/j.eml.2015.04.004     Document Type: Article

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