Electrochromic WO3 thin films prepared by combining ion-beam sputtering deposition with post-annealing

Materials Letters

Volumn 149, Issue , 2015, Pages 127-129

  Xue, Jinxin ^a   Zhu, Yiqi ^b   Jiang, Meiping ^a   Su, Jiangbin ^a   Liu, Yang ^a  

^a CHANGZHOU UNIVERSITY   (China)

^b JIANGSU UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Electrochromic; Ion beam technology; Oxygen deficiency phase; Thin films; WO3

Indexed keywords

ANNEALING; ELECTROCHROMISM; FILM PREPARATION; ION BEAMS; IONS; LIGHT MODULATION; OPTICAL SIGNAL PROCESSING; OXYGEN; SPUTTERING; THIN FILMS; TUNGSTEN COMPOUNDS;

ELECTROCHROMICS; ION BEAM SPUTTERING DEPOSITION; ION BEAM TECHNOLOGIES; OXYGEN DEFICIENCY; POST ANNEALING; POST-ANNEALING TEMPERATURE; WO3 FILMS; WO3 THIN FILMS;

OPTICAL FILMS;

EID: 84925298112     PISSN: 0167577X     EISSN: 18734979     Source Type: Journal    
DOI: 10.1016/j.matlet.2015.02.100     Document Type: Article

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