An ultrasensitive, uniform and large-area surface-enhanced Raman scattering substrate based on Ag or Ag/Au nanoparticles decorated Si nanocone arrays

Applied Physics Letters

Volumn 106, Issue 4, 2015, Pages

  Zhang, P P ^a   Gao, J ^a   Sun, X H ^a  

^a SOOCHOW UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD; METAL NANOPARTICLES; NANOPARTICLES; NANOSTRUCTURES; NANOTECHNOLOGY; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICON; SILVER; SURFACE SCATTERING;

AG/AU NANO-PARTICLES; ENHANCEMENT FACTOR; NANOFABRICATION PROCESS; REACTION ION ETCHING; SERS-ACTIVE SUBSTRATES; SI NANOCONE ARRAYS; SURFACE ENHANCED RAMAN SCATTERING (SERS); SURFACE ENHANCED RAMAN SPECTROSCOPY;

SUBSTRATES;

EID: 84923882156     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4906800     Document Type: Article

References (39)

1. M. Fleischmann, P. J. Hendra, and M. Aj, Chem. Phys. Lett. 26, 163 (1974). 10.1016/0009-2614(74)85388-1
2. K. Kneipp, Y. Wang, H. Kneipp, L. T. Perelman, I. Itzkan, R. Dasari, and M. S. Feld, Phys. Rev. Lett. 78, 1667 (1997). 10.1103/PhysRevLett.78.1667
3. S. M. Nie and S. R. Emery, Science 275, 1102 (1997). 10.1126/science.275.5303.1102
4. H. C. Lo, H. I. Hsiung, S. Chattopadhyay, H. C. Han, C. F. Chen, J. P. Leu, K. H. Chen, and L. C. Chen, Biosens. Bioelectron. 26, 2413 (2011). 10.1016/j.bios.2010.10.022
5. K. Kneipp, H. Kneipp, I. Itzkan, R. R. Dasari, and M. S. Feld, Curr. Sci. 77, 915 (1999).
6. S. S. R. Dasary, A. K. Singh, D. Senapati, H. T. Yu, and P. C. Ray, J. Am. Chem. Soc. 131, 13806 (2009). 10.1021/ja905134d
7. Y. Zhou, J. Chen, L. Zhang, and L. B. Yang, Eur. J. Inorg. Chem. 2012, 3176 (2012). 10.1002/ejic.201200009
8. C. Y. Wen, F. Liao, S. S. Liu, Y. Zhao, Z. H. Kang, X. L. Zhang, and M. W. Shao, Chem. Commun. 49, 3049 (2013). 10.1039/c3cc37877b
9. Z. Q. Tian, B. Ren, and D. Y. Wu, J. Phys. Chem. B 106, 9463 (2002). 10.1021/jp0257449
10. N. Felidj, J. Aubard, G. Levi, J. R. Krenn, A. Hohenau, G. Schider, A. Leitner, and F. R. Aussenegg, Appl. Phys. Lett. 82, 3095 (2003). 10.1063/1.1571979
11. D. Pristinski, S. L. Tan, M. Erol, H. Du, and S. Sukhishvili, J. Raman Spectrosc. 37, 762 (2006). 10.1002/jrs.1496
12. E. Laux, C. Genet, T. Skauli, and T. W. Ebbesen, Nat. Photonics 2, 161 (2008). 10.1038/nphoton.2008.1
13. U. S. Dinish, F. C. Yaw, A. Agarwal, and M. Olivo, Biosens. Bioelectron. 26, 1987 (2011). 10.1016/j.bios.2010.08.069
14. M. Kahl, E. Voges, S. Kostrewa, C. Viets, and W. Hill, Sens. Actuators, B 51, 285 (1998). 10.1016/S0925-4005(98)00219-6
15. J. C. Hulteen and R. P. Vanduyne, J. Vac. Sci. Technol., A 13, 1553 (1995). 10.1116/1.579726
16. L. Liu, H. Huang, A. Hu, G. Zou, L. Quintino, and Y. Zhou, Nano-Micro Lett. 5, 88 (2013). 10.1007/BF03353734
17. R. H. Que, M. W. Shao, S. J. Zhuo, C. Y. Wen, S. D. Wang, and S. T. Lee, Adv. Funct. Mater. 21, 3337 (2011). 10.1002/adfm.201100641
18. Y. Yang, J. L. Shi, G. Kawamura, and M. Nogami, Scr. Mater. 58, 862 (2008). 10.1016/j.scriptamat.2008.01.017
19. B. W. Boote, H. Byun, and J. H. Kim, Gold Bull. 46, 185 (2013). 10.1007/s13404-013-0099-4
20. P. P. Zhang, S. M. Yang, L. S. Wang, J. Zhao, Z. C. Zhu, B. Liu, J. Zhong, and X. H. Sun, Nanotechnology 25, 245301 (2014). 10.1088/0957-4484/25/24/245301
21. Q. M. Yu, S. Braswell, B. Christin, J. J. Xu, P. M. Wallace, H. Gong, and D. Kaminsky, Nanotechnology 21, 355301 (2010). 10.1088/0957-4484/21/35/355301
22. C. W. Cheng, B. Yan, S. M. Wong, X. L. Li, W. W. Zhou, T. Yu, Z. X. Shen, H. Y. Yu, and H. J. Fan, ACS Appl. Mater. Interfaces 2, 1824 (2010). 10.1021/am100270b
23. H. B. Hu, Z. H. Wang, L. Pan, S. P. Zhao, and S. Y. Zhu, J. Phys. Chem. C 114, 7738 (2010). 10.1021/jp100141c
24. M. W. Shao, M. L. Zhang, N. B. Wong, D. D. D. Ma, H. Wang, W. W. Chen, and S. T. Lee, Appl. Phys. Lett. 93, 233118 (2008). 10.1063/1.2969292
25. M. S. Schmidt, J. Hubner, and A. Boisen, Adv. Mater. 24, Op11 (2012). 10.1002/adma.201103496
26. Y. M. Lai, J. Wang, T. He, and S. Q. Sun, Anal. Lett. 47, 833 (2014). 10.1080/00032719.2013.850089
27. M. Moskovits, Rev. Mod. Phys. 57, 783 (1985). 10.1103/RevModPhys.57.783
28. K. Kneipp, H. Kneipp, I. Itzkan, R. R. Dasari, and M. S. Feld, Chem. Rev. 99, 2957 (1999). 10.1021/cr980133r
29. S. Chattopadhyay, H. C. Lo, C. H. Hsu, L. C. Chen, and K. H. Chen, Chem. Mater. 17, 553 (2005). 10.1021/cm049269y
30. H. Jansen, M. Deboer, R. Legtenberg, and M. Elwenspoek, J. Micromech. Microeng. 5, 115 (1995). 10.1088/0960-1317/5/2/015
31. M. F. Peng, H. Y. Xu, and M. W. Shao, Appl. Phys. Lett. 104, 193103 (2014). 10.1063/1.4876958
32. See supplementary material at http://dx.doi.org/10.1063/1.4906800 E-APPLAB-106-004505 for the schematic illustration of fabrication process (Figure S1) and SERS spectra on Si wafer (Figure S2).
33. J. C. Hulteen, D. A. Treichel, M. T. Smith, M. L. Duval, T. R. Jensen, and R. P. Van Duyne, J. Phys. Chem. B 103, 3854 (1999). 10.1021/jp9904771
34. Y. L. Deng and Y. J. Juang, Biosens. Bioelectron. 53, 37 (2014). 10.1016/j.bios.2013.09.032
35. H. Y. Liang, Z. P. Li, W. Z. Wang, Y. S. Wu, and H. X. Xu, Adv. Mater. 21, 4614 (2009). 10.1002/adma.200901139
36. M. J. Natan, Faraday Discuss. 132, 321 (2006). 10.1039/b601494c
37. M. L. Zhang, X. Fan, H. W. Zhou, M. W. Shao, J. A. Zapien, N. B. Wong, and S. T. Lee, J. Phys. Chem. C 114, 1969 (2010). 10.1021/jp902775t
38. R. Gunawidjaja, S. Peleshanko, H. Ko, and V. V. Tsukruk, Adv. Mater. 20, 1544 (2008). 10.1002/adma.200703170
39. Z. L. Huang, G. W. Meng, Q. Huang, Y. J. Yang, C. H. Zhu, and C. L. Tang, Adv. Mater. 22, 4136 (2010). 10.1002/adma.201001179