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Volumn 15, Issue 5, 2015, Pages 563-568

Atmospheric pressure plasma treatment on graphene grown by chemical vapor deposition

Author keywords

Atmospheric pressure; Chemical vapor deposition; Doping; Graphene; Plasma

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); NITROGEN PLASMA; PHOTOELECTRON SPECTROSCOPY; PLASMA APPLICATIONS; PLASMA JETS; PLASMAS; SEMICONDUCTOR DOPING; SILICA; SURFACE DEFECTS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84923082943     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2015.02.013     Document Type: Article
Times cited : (20)

References (32)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.