Layer-by-layer thinning of graphene by plasma irradiation and post-annealing

Nanotechnology

Volumn 23, Issue 2, 2012, Pages

  Yang, Xichao ^a   Tang, Shujie ^a   Ding, Guqiao ^a   Xie, Xiaoming ^a   Jiang, Mianheng ^a   Huang, Fuqiang ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE; BI-LAYER; DAMAGED LAYERS; DEVICE FABRICATIONS; FAST OXIDATION; GRAPHENE PLANE; LAYER-BY-LAYERS; PLASMA IRRADIATIONS; POST ANNEALING; POSTSYNTHESIS; RAMAN ANALYSIS; SINGLE LAYER; THIN MULTILAYERS;

ANNEALING; ELECTRON BEAMS; IRRADIATION; LITHOGRAPHY; MONOLAYERS; NITROGEN PLASMA;

GRAPHENE;

EID: 83755168036     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/2/025704     Document Type: Article

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