Multi-stencil character projection e-beam lithography: A fast and flexible way for high quality optical metamaterials

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9231, Issue , 2014, Pages

  Huebner, Uwe ^a   Falkner, Matthias ^b   Zeitner, Uwe D ^b,c   Banasch, Michael ^d   Dietrich, Kay ^b   Kley, Ernst Bernhard ^b  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^c FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^d Vistec Electron Beam GmbH   (Germany)

Author keywords

character projection; Electron beam lithography; metamaterial; photonic nanomaterials; plasmonic

Indexed keywords

ELECTRON BEAMS; FABRICATION; GAUSSIAN BEAMS; LITHOGRAPHY; METAMATERIALS; NANOSTRUCTURED MATERIALS; OPTICAL MATERIALS;

CHARACTER PROJECTIONS; E-BEAM LITHOGRAPHY; OPTICAL METAMATERIALS; PATTERN QUALITY; PATTERN SIZE; PERFECT ABSORBER; PLASMONIC; TIME REDUCTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 84922879837     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2065944     Document Type: Conference Paper

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