Enhanced e-beam pattern writing for nano-optics based on character projection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8352, Issue , 2012, Pages

  Kley, E Bernhard ^a   Schmidt, Holger ^a   Zeitner, Uwe ^b   Banasch, Michael ^c   Schnabel, Bernd ^c  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^c Vistec Electron Beam GmbH   (Germany)

Author keywords

Character projection; E beam; Electron beam lithography; Nano optics; Shot count reduction

Indexed keywords

CHARACTER PROJECTIONS; COMPLEX PATTERN; COMPLEX STRUCTURE; E-BEAM; E-BEAM LITHOGRAPHY; FEATURE SIZES; GEOMETRICAL PRIMITIVES; HIGH DEMAND; HIGH RESOLUTION; NANOOPTICS; OPTICAL APPLICATIONS; PATTERN GENERATION; PATTERN QUALITY; SINGLE SHOTS; VARIABLE SHAPED BEAMS; WRITING SPEED;

BOTTLES; NANOPHOTONICS; PHOTOMASKS;

ELECTRON BEAM LITHOGRAPHY;

EID: 84861944882     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.920562     Document Type: Conference Paper

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