Negative-index materials: Two approaches for nanofabricated metamaterials

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 1138-1141

  Huebner, Uwe ^a   Petschulat, Joerg ^b   Pshenay Severin, Ekaterina ^b   Chipouline, Arkadi ^b   Pertsch, Thomas ^b   Rockstuhl, Carsten ^b   Lederer, Falk ^b  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Electron beam lithography; Lift off; Metal deposition; Metamaterial; Negative index materials; Subwavelength gratings

Indexed keywords

DIFFERENT GEOMETRIES; MANUFACTURING TECHNOLOGIES; METAL DEPOSITION; NEGATIVE INDICES; NEGATIVE-INDEX MATERIALS; PRACTICAL REALIZATIONS; SUBWAVELENGTH GRATINGS; VISIBLE AND NEAR INFRARED; WIRE GEOMETRIES;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRONIC EQUIPMENT; INFRARED DEVICES; REFRACTIVE INDEX;

METAMATERIALS;

EID: 67349111682     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.01.064     Document Type: Article

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