Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8974, Issue , 2014, Pages

  Zeitner, Uwe D ^a,b   Harzendorf, Torsten ^b   Fuchs, Frank ^b   Banasch, Michael ^c   Schmidt, Holger ^a   Kley, Ernst Bernhard ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^c Vistec Electron Beam GmbH   (Germany)

Author keywords

Character projection; Diffractive elements; Electron beam lithography; Nano optics; Plasmonics

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; OPTICS; PLASMONS;

CHARACTER PROJECTIONS; DIFFRACTIVE ELEMENT; E-BEAM LITHOGRAPHY; HIGHLY PARALLELS; NANOOPTICS; PERIODIC PATTERN; PLASMONICS; TIME REDUCTION;

FABRICATION;

EID: 84900808154     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2040206     Document Type: Conference Paper

References (4)

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3. X. Thrun et al. "15 days electron beam exposure for manufacturing of large area silicon based NIL master," Microelectr. Engineering Vol. 110 (2013).
4. T. Lee, C. Lin, S. Ma, C. Sun, "Analysis of position-dependent light extraction of GaN-based LEDs", Optics Express, Vol. 13, No. 11 (2005).