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Microelectronic Engineering

Volumn 111, Issue , 2013, Pages 110-113

Exploiting extreme coupling to realize a metamaterial perfect absorber

(10) Huebner, Uwe a Pshenay Severin, Ekaterina b Alaee, Rasoul b Menzel, Christoph b Ziegler, Mario a Rockstuhl, Carsten b Lederer, Falk b Pertsch, Thomas b Meyer, Hans Georg a Popp, Juergen a,b

a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY (Germany)

b FRIEDRICH SCHILLER UNIVERSITY JENA (Germany)

Author keywords

Electron beam lithography; Lift off; Metamaterial; Perfect absorption; Plasmonic

Indexed keywords

ATOMIC LAYER DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; GOLD; OPTICAL MATERIALS; PLASMONS;

LIFT OFFS; LIFTOFF TECHNIQUE; MULTIPLE RESONANCES; NANOSTRUCTURED GOLD; PERFECT ABSORBER; PLASMONIC; RESONANCE FREQUENCIES; ULTRA-THIN OXIDE LAYERS;

METAMATERIALS;

EID: 84885185939 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2013.02.028 Document Type: Article

Times cited : (20)

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