Recent advances in the design of resist materials for 157 nm lithography

Journal of Photopolymer Science and Technology

Volumn 17, Issue 4, 2004, Pages 621-630

  Houlihan, Francis ^a   Sakamuri, Raj ^a   Romano, Andrew ^a   Rentkiewicz, David ^a   Dammel, Ralph R ^a   Stepanenko, Nickolay ^b   Markert, M ^b   Vermeir, U Mierau Inge ^b   Hohle, Christoph ^b   Conley, Will ^c   Miller, Daniel ^c   Itani, Toshiro ^d   Shigematsu, Masato ^d   Kawaguchi, Etsuro ^d  

^a CLARIANT CORPORATION   (United States)

^b INFINEON TECHNOLOGIES AG   (Germany)

^c SEMATECH   (United States)

^d SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

157 nm; 193 nm immersion lithography; Barrier coat; High transparency; Photoacidgenertor; Resist

Indexed keywords

ACID; ALCOHOL DERIVATIVE; BASE; CARBONYL DERIVATIVE; FLUORINE DERIVATIVE; FLUOROALCOHOL; PERFLUORO COMPOUND; RESIN; TERT BUTOXYCARBONYLMETHYL DERIVATIVE; UNCLASSIFIED DRUG;

ABSORPTION SPECTROSCOPY; ADDITION REACTION; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL REACTION; CHEMICAL STRUCTURE; CONCENTRATION RESPONSE; DEVICE; FILM; IMAGING SYSTEM; LITHOGRAPHY; MEASUREMENT; MOLECULAR SIZE; PARAMETER; REACTION ANALYSIS; STRUCTURE ANALYSIS; SYNTHESIS; TECHNIQUE; TECHNOLOGY; THICKNESS;

EID: 3142616884     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.621     Document Type: Article

References (9)

1. th International Symposium on 157 nm Lithography August 2003, Yokohama Japan
2. th International Symposium on 157 nm Lithography August 2003, Yokohama Japan
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4. Hoang V. Tran, Raymond J. Hung, Takashi Chiba, Shitaro Yamada, Thomas Mrozek, Yu-Tsai Hsieh, Charles R. Chambers, Brian P. Osborn, Brian C. Trique, Matthew J. Pinnow, Scott A. MacDonald, C. Grant Willson, Daniel P. Sanders, Eric F. Connor, Robert H. Grubbs, Will Conley, Macromolecules 35, 6539, (2002)
5. Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji, Okada, Yasuhide, Kawaguchi, Naomi Schida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani, Advances in Resist Technology and Processing XIX, Proceedings of SPIE Vol 4690 p76 (2002).
6. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, Chun Chang, Advances in Resist Technology and Processing XX, Proceedings of SPIE 5039, 22 (2003).
7. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, Chun Chang, Journal of Photopolymer Science and Technology, Volume 16(4), 581 (2003).
8. Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph R. Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joe McDaniels, ChunChang Advances in Resist Technology and Processing XX, Proceedings of SPIE 5039, 641 (2003).
9. H. Ito, W. Hinsberg, L. Rhodes, Chang, SPIE Proceedings Vol 5039, 70, 2003