XPS and 19F NMR study of the photodegradation at 157 nm of photolithographic-grade teflon AF thin films

Macromolecules

Volumn 38, Issue 10, 2005, Pages 4050-4053

  Blakey, Idriss ^a   George, Graeme A ^b   Hill, David J T ^a   Liu, Heping ^a   Rasoul, Firas ^a   Whittaker, Andrew K ^a   Zimmerman, Paul ^c  

^a UNIVERSITY OF QUEENSLAND   (Australia)

^b QUEENSLAND UNIVERSITY OF TECHNOLOGY   (Australia)

^c SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHAIN SCISSION; DEFLUORINATION; PDD RINGS; THIN FILM POLYMERS;

COPOLYMERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE; ORGANIC POLYMERS; PHOTOLITHOGRAPHY; POLYTETRAFLUOROETHYLENES; SPIN COATING; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTODEGRADATION;

EID: 19944387955     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma047436+     Document Type: Article

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