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Fujitsu Scientific and Technical Journal

Volumn 38, Issue 1, 2002, Pages 3-12

High-performance resist materials for ArF excimer laser and electron beam lithography

(2) Nozaki, Koji a Yano, Ei a

a FUJITSU LABORATORIES LTD (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ARGON; ELECTRON BEAM LITHOGRAPHY; ESTERS; POLYMERS; ULSI CIRCUITS;

METHACRYLATE POLYMERS;

EXCIMER LASERS;

EID: 0036325727 PISSN: 00162523 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (16)

References (20)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.