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Volumn 47, Issue 18, 2014, Pages 6365-6372

Sensitive characterization of the influence of substrate interfaces on supported thin films

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY TRANSFER; GLASS TRANSITION; POLYMER FILMS; POLYMERS; SUBSTRATES; SURFACE CHEMISTRY; THIN FILMS; ULTRATHIN FILMS;

EID: 84918516596     PISSN: 00249297     EISSN: 15205835     Source Type: Journal    
DOI: 10.1021/ma500864k     Document Type: Article
Times cited : (46)

References (77)
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    • Soles, C.L.1    Ding, Y.2
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    • Reiter, G.1
  • 61
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    • The effect of film thickness on the dissolution rate and hydrogen bonding behavior of photoresist polymer thin films
    • Sturtevant, J. L., ed.
    • Singh, L.; Ludovice, P. J.; Henderson, C. L. The effect of film thickness on the dissolution rate and hydrogen bonding behavior of photoresist polymer thin films. In Advances In Resist Technology and Processing XXII, Pt. 1 and 2; Sturtevant, J. L., ed.; 2005; Vol. 5753, pp 319-328.
    • (2005) Advances in Resist Technology and Processing XXII , vol.5753 , pp. 319-328
    • Singh, L.1    Ludovice, P.J.2    Henderson, C.L.3
  • 62
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    • Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films
    • Fedynyshyn, T. H., ed.
    • Singh, L.; Ludovice, P. J.; Henderson, C. L., Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films. In Advances In Resist Technology and Processing Xx, Pts 1 and 2, Fedynyshyn, T. H., ed.; 2003; Vol. 5039, pp 1008-1018.
    • (2003) Advances in Resist Technology and Processing Xx , vol.5039 , pp. 1008-1018
    • Singh, L.1    Ludovice, P.J.2    Henderson, C.L.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.