SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 46, Issue 10-11, 2014, Pages 936-939

Dual beam organic depth profiling using large argon cluster ion beams

(5) Holzweber, M a Shard, A G b Jungnickel, H c Luch, A c Unger, W E S a

a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING (Germany)

b NATIONAL PHYSICAL LABORATORY (United Kingdom)

c FEDERAL INSTITUTE FOR RISK ASSESSMENT (Germany)

Author keywords

Ar GCIB; Argon cluster; Organic depth profiling; SIMS; ToF SIMS

Indexed keywords

ARGON; CLUSTER ANALYSIS; ION BEAM ASSISTED DEPOSITION; ION BEAMS; KINETIC ENERGY; KINETICS; ORGANIC LIGHT EMITTING DIODES (OLED); SECONDARY ION MASS SPECTROMETRY;

ARGON CLUSTERS; DEPTH RESOLUTION; ORGANIC COMPONENTS; ORGANIC DEPTH PROFILING; ORGANIC MULTILAYERS; REFERENCE MATERIAL; SPUTTER YIELDS; TOF SIMS;

DEPTH PROFILING;

EID: 84908149056 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.5429 Document Type: Article

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.