Plasmonic nanoring fabrication tuned to pitch: Efficient, deterministic, and large scale realization of ultra-small gaps for next generation plasmonic devices

Applied Physics Letters

Volumn 105, Issue 14, 2014, Pages

  Lehr, D ^a   Alaee, R ^b   Filter, R ^a   Dietrich, K ^a   Siefke, T ^a   Rockstuhl, C ^b,c   Lederer, F ^a   Kley, E B ^a   Tunnermann A ^a,d  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^c KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^d FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMONIC DEVICES; ULTRA-SMALL;

EID: 84908006704     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4897497     Document Type: Article

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