Advanced lithography for micro-optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6290, Issue , 2006, Pages

  Zeitner, U D ^a   Kley, E B ^b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Diffractive optics; e beam lithography; Laser lithography; Micro optics

Indexed keywords

DIFFRACTIVE OPTICS; MICROOPTICS; MICROSTRUCTURE; OPTICAL DESIGN; SEMICONDUCTOR MATERIALS;

FABRICATION LIMITS; LASER LITHOGRAPHY; MICROELECTRONICS FABRICATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 33750458010     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.682739     Document Type: Conference Paper

References (5)

1. B. Schnabel "Microlithographic Pattern Generation for Optics," in Microoptics - From Technology to Applications, J. Jahns, K.-H. Brenner eds., Springer, 2004.
2. M.T. Gale, "Direct Writing of Continuous-relief Micro-optics" in Micro-Optics, H.P. Herzig, ed. (Taylor & Francis, London, 1997).
3. M. Stern, "An overview of binary optics process technology," Tech. Digest of the Conference on Difiractive Optics: Design, Fabrication, and Applications, pp 334-337, OSA, 1994.
4. E.-B. Kley, "Continuous profile writing by electron and optical lithography," Microelectr. Eng. 34, pp 261-298, 1997.
5. T. Clausnitzer, private communication, to be published.