Microstructure of highly strained BiFeO3thin films: Transmission electron microscopy and electron-energy loss spectroscopy studies

Journal of Applied Physics

Volumn 115, Issue 4, 2014, Pages

  Heon Kim, Young ^a,b   Bhatnagar, Akash ^a   Pippel, Eckhard ^a   Alexe, Marin ^a,c   Hesse, Dietrich ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b Korea Research Institute of Standards and Science   (South Korea)

^c UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; BISMUTH METALLOGRAPHY; DISSOCIATION; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON SCATTERING; ELECTRONIC STRUCTURE; ELECTRONS; ENERGY DISSIPATION; FERRITE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IRON COMPOUNDS; LANTHANUM COMPOUNDS; MICROSTRUCTURE; SODIUM ALUMINATE; SUBSTRATES; THIN FILMS; TRANSMISSIONS;

BISMUTH FERRITES; FIRST PRINCIPLE CALCULATIONS; INTERMEDIATE TEMPERATURES; LANTHANUM ALUMINATE; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SMOOTH TRANSITIONS; TETRAGONAL PHASE; TETRAGONAL PHASIS;

ELECTRON ENERGY LOSS SPECTROSCOPY;

EID: 84907558672     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4863778     Document Type: Article

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