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Advanced Materials

Volumn 23, Issue 28, 2011, Pages 3170-3175

Nanoscale structure and mechanism for enhanced electromechanical response of highly strained BiFeO3 thin films

(7) Damodaran, Anoop R a Liang, Chen Wei a He, Qing b Peng, Chun Yen c Chang, Li c Chu, Ying Hao c Martin, Lane W a

a University of Illinois at Urbana Champaign (United States)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

c NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

electromechanical responses; phase transitions; thin films

Indexed keywords

BISMUTH COMPOUNDS; ELECTRIC FIELDS; IRON COMPOUNDS; PHASE TRANSITIONS; SCANNING PROBE MICROSCOPY; X RAY DIFFRACTION;

BIFEO3 THIN FILM; ELECTRIC FIELD INDUCED; ELECTROMECHANICAL RESPONSE; HIGH RESOLUTION X RAY DIFFRACTION; HIGHLY STRAINED; MONOCLINIC PHASE; NANOSCALE STRUCTURE;

THIN FILMS;

EID: 79960537498 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201101164 Document Type: Article

Times cited : (144)

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