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Japanese Journal of Applied Physics

Volumn 53, Issue 9, 2014, Pages

Threefold atmospheric-pressure annealing for suppressing graphene nucleation on copper in chemical vapor deposition

(4) Suzuki, Seiya a Nagamori, Takashi a Matsuoka, Yuki a Yoshimura, Masamichi a

a TOYOTA TECHNOLOGICAL INSTITUTE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COPPER; ELECTROLYTIC POLISHING; GRAPHENE; NUCLEATION; SINGLE CRYSTALS;

AUGER ELECTRON MAPPING; CHEMICAL VAPOR DEPOSITIONS (CVD); DOMAIN SIZE; LOWER DENSITY;

ANNEALING;

EID: 84906875376 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.7567/JJAP.53.095101 Document Type: Article

Times cited : (24)

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