Enabling the lithography roadmap: An immersion tool based on a Novel Stage Positioning System

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  De Jong, Fred ^a   Van Der Pasch, Bert ^a   Castenmiller, Tom ^a   Vleeming, Bert ^a   Droste, Richard ^a   Van De Mast, Frank ^a  

^a ASML   (Netherlands)

Author keywords

Double patterning enabler; High acceleration waferstage; Immersion lithography tool; New stage positioning system

Indexed keywords

32-NM NODE; CRITICAL SYSTEMS; DOUBLE PATTERNING ENABLER; EXPOSURE SYSTEM; EXPOSURE TOOL; EXPOSURE-TIME; HIGH ACCELERATION; HIGH ACCELERATION WAFERSTAGE; IMMERSION LENS; IMMERSION LITHOGRAPHY TOOL; INCREASED PRODUCTIVITY; INTERFEROMETER SYSTEMS; LENS ABERRATION; MULTIPLE EXPOSURE; NEW APPLICATIONS; NEW STAGE POSITIONING SYSTEM; NEW TECHNOLOGIES; OPTIMAL POSITIONING; PERFORMANCE DATA; POSITION MEASUREMENT SYSTEMS; POSITIONING SYSTEM; PRODUCTION ENVIRONMENTS; PRODUCTIVITY ENHANCEMENT; ROADMAP; THERMAL STABILITY; WAFER STAGE;

EXPOSURE METERS; LENSES; OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; POSITION MEASUREMENT; PRODUCTIVITY; TECHNOLOGICAL FORECASTING; TELECOMMUNICATION LINKS;

SYSTEM STABILITY;

EID: 65849183404     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814254     Document Type: Conference Paper

References (1)

1. André Engelen, Igor Bouchoms, Melchior Mulder, Steve Hansen, Bert Vleeming, Jan Willem Gemmink, Anita Bouma, Anthony Ngai, Joerg Zimmerman (Carl Zeiss), Imaging solutions to extend single exposure using 1.35NA, these conference proceedings.