A new silicon drift detector for high spatial resolution STEM-XEDS: Performance and applications

Microscopy and Microanalysis

Volumn 20, Issue 4, 2014, Pages 1046-1052

  Phillips, Patrick J ^a   Paulauskas, Tadas ^a   Rowlands, Neil ^b   Nicholls, Alan W ^a   Low, Ke Bin ^c   Bhadare, Santokh ^b   Klie, Robert F ^a  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

^b OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

^c BASF   (United States)

Author keywords

atomic resolution; silicon drift detector; STEM; XEDS

Indexed keywords

EID: 84905163848     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927614001639     Document Type: Article

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