Simulation and fabrication of nanostructures with laser interference lithography

Laser Physics

Volumn 24, Issue 6, 2014, Pages

  Yang, H F ^a   He, H D ^a   Zhao, E L ^a   Han, J ^a   Hao, J B ^a   Qian, J G ^a   Tang, W ^a   Zhu, H ^a  

^a CHINA UNIVERSITY OF MINING AND TECHNOLOGY   (China)

Author keywords

dynamic controlling; laser interference lithography; nanostructures; simulation

Indexed keywords

EXPERIMENTS; NANOSTRUCTURES; PHOTORESISTS;

DOUBLE EXPOSURE; LASER INTERFERENCE LITHOGRAPHY; NANOTEXTURED SURFACE; SILICON SUBSTRATES; SIMULATION; SINGLE EXPOSURE; TWO-BEAM INTERFERENCE; TWO-DIMENSIONAL GRIDS;

NANOLITHOGRAPHY;

EID: 84902687642     PISSN: 1054660X     EISSN: 15556611     Source Type: Journal    
DOI: 10.1088/1054-660X/24/6/065901     Document Type: Article

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