Investigation of the thermal stability of Cu nanowires using atomistic simulations

Journal of Applied Physics

Volumn 115, Issue 21, 2014, Pages

  Granberg, F ^a   Parviainen, S ^a   Djurabekova, F ^a   Nordlund, K ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR DYNAMICS; NANOWIRES; WIRE;

ABSOLUTE VALUES; ATOMISTIC SIMULATIONS; CLASSICAL MOLECULAR DYNAMICS; COPPER NANOWIRES; CROSS-SECTIONAL SHAPE; LIQUID DROP MODEL; MELTING POINT DEPRESSIONS; SEMI-EMPIRICAL;

MELTING POINT;

EID: 84902602919     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4876743     Document Type: Article

References (35)

1. L. Cademartiri and G. A. Ozin, Adv. Mater. 21 (9), 1013-1020 (2009). 10.1002/adma.200801836
2. K. J. Courey, S. S. Asfour, J. A. Bayliss, L. L. Ludwig, and M. C. Zapata, IEEE Trans. Electron. Packag. Manuf. 31 (1), 32-40 (2008). 10.1109/TEPM.2007.914210
3. E. Hourdakis, G. W. Bryant, and N. M. Zimmerman, J. Appl. Phys. 100 (12), 123306 (2006). 10.1063/1.2400103
4. R. Behrisch, in Physics of Plasma-Wall Interactions in Controlled Fusion, edited by D. E. Post and R. Behrisch (Plenum Press, 1984).
5. W. H. Qi and M. P. Wang, J. Mater. Sci. Lett. 21 (22), 1743-1745 (2002). 10.1023/A:1020904317133
6. A. Arbouet, C. Voisin, D. Christofilos, P. Langot, N. Del Fatti, F. Vallée, J. Lermé, G. Celep, E. Cottancin, M. Gaudry, M. Pellarin, M. Broyer, M. Maillard, M. P. Pileni, and M. Treguer, Phys. Rev. Lett. 90 (17), 177401 (2003). 10.1103/PhysRevLett.90.177401
7. H. Kura and T. Ogawa, J. Appl. Phys. 107 (7), 074310 (2010). 10.1063/1.3369441
8. X. Wen, Y. Xie, C. L. Choi, K. C. Wan, X.-Y. Li, and S. Yang, Langmuir 21 (10), 4729-4737 (2005). 10.1021/la050038v
9. J. S. Jin, J. S. Lee, and O. Kwon, Appl. Phys. Lett. 92 (17), 171910 (2008). 10.1063/1.2917454
10. B. Feng, Z. Li, and X. Zhang, Thin Solid Films 517 (8), 2803-2807 (2009). 10.1016/j.tsf.2008.10.116
11. A. Emre Yarimbiyik, H. A. Schafft, R. A. Allen, M. D. Vaudin, and M. E. Zaghloul, Microelectron. Reliab. 49 (2), 127-134 (2009). 10.1016/j.microrel. 2008.11.003
12. S. Karim, K. Maaz, G. Ali, and W. Ensinger, J. Phys. D: Appl. Phys. 42 (18), 185403 (2009). 10.1088/0022-3727/42/18/185403
13. K. K. Nanda, Pramana 72 (4), 617-628 (2009). 10.1007/s12043-009-0055-2
14. M. Wautelet, J. Phys. D: Appl. Phys. 24 (3), 343 (1991). 10.1088/0022-3727/24/3/017
15. K. K. Nanda, S. N. Sahu, and S. N. Behera, Phys. Rev. A 66 (1), 013208 (2002). 10.1103/PhysRevA.66.013208
16. M. E. Toimil Molares, A. G. Balogh, T. W. Cornelius, R. Neumann, and C. Trautmann, Appl. Phys. Lett. 85, 5337 (2004) 10.1063/1.1826237.
17. D. Wang, J. Zhao, S. Hu, X. Yin, S. Liang, Y. Liu, and S. Deng, Nano Lett. 7 (5), 1208 (2007). 10.1021/nl0629512
18. Y. Liu, J. Zhao, and F. Wang, Phys. Rev. B 80 (11), 115417 (2009). 10.1103/PhysRevB.80.115417
19. X. W. Wang, G. T. Fei, K. Zheng, Z. Jin, and L. De Zhang, Appl. Phys. Lett. 88 (17), 173114 (2006). 10.1063/1.2199469
20. V. Bogomolov, E. Kolla, and Y. Kumzerov, JETP Lett. 41 (1), 34 (1985).
21. L. Hui, B. L. Wang, J. L. Wang, and G. H. Wang, J. Chem. Phys. 120 (7), 3431 (2004). 10.1063/1.1640613
22. B. Wang, G. Wang, X. Chen, and J. Zhao, Phys. Rev. B 67 (19), 193403 (2003). 10.1103/PhysRevB.67.193403
23. O. Gülseren, F. Ercolessi, and E. Tosatti, Phys. Rev. B 51 (11), 7377 (1995). 10.1103/PhysRevB.51.7377
24. K. Nordlund, M. Ghaly, R. S. Averback, M. Caturla, T. Diaz de la Rubia, and J. Tarus, Phys. Rev. B 57 (13), 7556 (1998). 10.1103/PhysRevB.57.7556
25. M. Ghaly, K. Nordlund, and R. S. Averback, Philos. Magn. A 79 (4), 795-820 (1999). 10.1080/01418619908210332
26. M. J. Sabochick and N. Q. Lam, Phys. Rev. B 43 (7), 5243 (1991). 10.1103/PhysRevB.43.5243
27. S. M. Foiles, M. I. Baskes, and M. S. Daw, Phys. Rev. B 33 (12), 7983 (1986). 10.1103/PhysRevB.33.7983
28. C. L. Kelchner, D. M. Halstead, L. S. Perkins, N. M. Wallace, and A. E. DePristo, Surf. Sci. 310 (1-3), 425-435 (1994). 10.1016/0039-6028(94)91405-2
29. S. M. Foiles and J. B. Adams, Phys. Rev. B 40 (9), 5909 (1989). 10.1103/PhysRevB.40.5909
30. S. B. Sinnott, M. S. Stave, T. J. Raeker, and A. E. DePristo, Phys. Rev. B 44, 8927-8941 (1991) 10.1103/PhysRevB.44.8927.
31. K. Nordlund and R. S. Averback, Phys. Rev. B 56 (5), 2421 (1997). 10.1103/PhysRevB.56.2421
32. H. J. C. Berendsen, J. P. M. Postma, W. F. van Gunsteren, A. DiNola, and J. R. Haak, J. Chem. Phys. 81 (8), 3684 (1984). 10.1063/1.448118
33. L. Hui, F. Pederiva, B. L. Wang, J. L. Wang, and G. H. Wang, Appl. Phys. Lett. 86 (1), 011913 (2005). 10.1063/1.1844046
34. V. K. Sutrakar and D. R. Mahapatra, Nanotechnology 20 (4), 045701 (2009). 10.1088/0957-4484/20/4/045701
35. J. Zhu, D. Shi, J. Zhao, and B. Wang, Nanotechnology 21 (18), 185703 (2010). 10.1088/0957-4484/21/18/185703