Cu2O/TiO2 nanoporous thin-film heterojunctions: Fabrication and electrical characterization

Materials Science in Semiconductor Processing

Volumn 25, Issue , 2014, Pages 181-185

  Hussain, Sajad ^a,b,d   Cao, Chuanbao ^a   Khan, Waheed S ^c   Nabi, Ghulam ^a   Usman, Zahid ^a   Majid, Abdul ^d   Alharbi, Thamer ^d   Ali, Zulfiqar ^a   Butt, Faheem K ^a   Tahir, Muhammad ^a   Tanveer, Muhammad ^a   Idress, Faryal ^a  

^a BEIJING INSTITUTE OF TECHNOLOGY   (China)

^b Department of Physics COMSATS Institute of Information Technology ^*  (Pakistan)

^c NATIONAL INSTITUTE FOR BIOTECHNOLOGY AND GENETIC ENGINEERING NIBGE   (Pakistan)

^d MAJMAAH UNIVERSITY   (Saudi Arabia)

Author keywords

Anodization; p n junction; Semiconductor

Indexed keywords

CARRIER CONCENTRATION; DIODES; ELECTRIC RESISTANCE; HETEROJUNCTIONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DIODES; SEMICONDUCTOR MATERIALS; TITANIUM DIOXIDE; X RAY DIFFRACTION; CHARACTERIZATION; SOLAR CELLS; THIN FILMS;

ANODIZATIONS; CAPACITANCE-VOLTAGE CHARACTERISTICS; ELECTRICAL CHARACTERIZATION; ELECTRICAL PARAMETER; MORPHOLOGICAL CHARACTERIZATION; NANO-POROUS FILMS; P-N JUNCTION; SPACE CHARGE REGIONS;

COPPER;

EID: 84902299074     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2013.11.018     Document Type: Article

References (28)

1. G. Jiang, R. Wang, H. Jin, Y. Wang, X. Sun, S. Wang, and T. Wang Powder Tech. 212 2011 284 288
2. D. Li, C.J. Chien, S. Deora, P.C. Chang, E. Moulin, and J.G. Lu Chem. Phys. Lett. 501 2011 446 450
3. L. Huang, P. Feng, H. Wang, H. Yu, and Z. Li Catalysis Commun. 10 2009 1839 1843
4. W. Siripala, A. Ivanovskaya, T.F. Jaramillo, S.H. Baeck, and E.W. McFarland Sol. Energy Mat. Sol. C 77 2003 229 237
5. Y. Bessekhouad, D. Robert, and J.V. Weber Catal. Today 101 2005 315 321
6. Y.G. Zhang, L.L. Ma, J.L. Li, and Y. Yu Environ. Sci. Technol. 41 2007 6264 6269
7. Y. Hou, X.Y. Li, Q.D. Zhao, X. Quan, and G.H. Chen Appl. Phys. Lett. 95 2009 093108 093111
8. S. Hussain, C. Cao, Z. Usman, Z. Chen, G. Nabi, W.S. Khan, Z. Ali, F.K. Butt, and T. Mahmood Thin Solid films 522 2012 430 434
9. F. Chaabouni, M. Abaab, and B. Rezig Superlattice Microstruct. 39 2006 171 178
10. W. Qingqing, X. Gang, and H. Gaorong J. Solid State Chem. 178 2005 2680 2685
11. M.M. El-Nahass, K.F. Abd-El-Rahman, and A.A.A. Darwish Microelectron. J. 38 2007 91 95
12. A.A.M. Farag, I.S. Yahia, and M. Fadel Int. J. Hydrogen Energy 34 2009 4906 4913
13. A.Z. Sadek, H. Zheng, K. Latham, W. Wlodarski, and K.K. Zadeh Langmuir 25 2009 509 514
14. T. Mahalingam, J.S.P. Chitra, J.P. Chu, H. Moon, H.J. Kwon, and Y.D. Kim J. Mater. Sci.: Mater. Electron. 17 2006 519 526
15. A.R. Zainun, S. Tomoya, U.M. Noor, M. Rusop, and I. Masay Mater. Lett. 66 2012 254 256
16. I. Masanobu, S. Tsutomu, M.T. Ko, I. Yuya, I. Minoru, and T. Akimasa J. Phys. D: Appl. Phys. 40 2007 3326 3329
17. T.Y. Tsai, S.J. Chang, T.J. Hsueh, H.T. Hsueh, W.Y. Weng, C.L. Hsu, and B.T. Dai Nanoscale Res. Lett. 6 2011 575 581
18. Y. Luo, L. Wang, Y. Zou, X. Sheng, L. Chang, and D. Yang Electrochem. Solid-State Lett. 15 2012 34 36
19. T.G.A. Malik Int. J. Electron. 72 1992 409 418
20. S. Darwish, A.S. Riad, and H.S. Soliman Semicond Sci. Technol. 11 1996 96 102
21. A.K. Hassan, and R.D. Gould Int. J. Electron. 69 1990 11 17
22. R.A. Singh, R. Singh, and D.N. Srivastava Synth. Met. 121 2001 1439 1440
23. W.G. Thompson, and R.L. Anderson Solid State Electron. 21 1978 603 608
24. R.K. Gupta, K. Ghosh, and P.K. Kahol Physica E 41 2009 617 620
25. P. Klason, M.M. Rahman, Q.H. Hu, O. Nur, R. Turan, and M. Willander Microelectron. J. 40 2009 706 710
26. M. Shah, M.H. Sayyad, K.S. Karimov, and F. Wahab J. Phys. D: Appl. Phys. 43 2010 405104 405108
27. S. Das, J.H. Kim, H.S. Choi, Y.K. Park, and Y.B. Hahn Electrochem. Commun. 13 2011 350 354
28. H. Norde J. Appl. Phys. 50 1979 5052 5053