A dual-cure, solid-state photoresist combining a thermoreversible diels-alder network and a chain growth acrylate network

Macromolecules

Volumn 47, Issue 10, 2014, Pages 3473-3482

  Berg, Gayla J ^a   Gong, Tao ^a   Fenoli, Christopher R ^a   Bowman, Christopher N ^a  

^a UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC MONOMERS; GLASS; MIXTURES; MONOMERS; PHOTORESISTS;

3D MICROSTRUCTURES; COVALENTLY CROSS-LINKED; CROSS-LINK DENSITIES; MECHANICAL BEHAVIOR; MULTIACRYLATE MONOMERS; TEMPERATURE DEPENDENT; TEMPERATURE SENSITIVITY; UNEXPOSED MATERIALS;

COMPLEX NETWORKS;

EID: 84901407032     PISSN: 00249297     EISSN: 15205835     Source Type: Journal    
DOI: 10.1021/ma500244r     Document Type: Article

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