Efficient antireflective downconversion Er3+ doped ZnO/Si thin film

Physics Letters, Section A: General, Atomic and Solid State Physics

Volumn 378, Issue 24-25, 2014, Pages 1733-1738

  Elleuch, R ^a   Salhi, R ^b   Al Quraishi, S I ^c   Deschanvres, J L ^d   Maalej R ^a  

^a University of Sfax   (Tunisia)

^b UNIVERSITY OF SFAX   (Tunisia)

^c KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS   (Saudi Arabia)

^d LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

Author keywords

AR coating; Downconversion; Erbium doped ZnO; Refractive index

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINITY; II-VI SEMICONDUCTORS; INFRARED DEVICES; PHOTONS; REFRACTIVE INDEX; SILICON SOLAR CELLS; ZINC OXIDE;

AEROSOL ASSISTED CHEMICAL VAPOR DEPOSITIONS (AACVD); ANTI-REFLECTIVE LAYERS; AR COATINGS; DEPOSITION CONDITIONS; DOWNCONVERSION; ERBIUM DOPED; HIGH REFRACTIVE INDEX; SI(111) SUBSTRATE;

THIN FILMS;

EID: 84901199031     PISSN: 03759601     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physleta.2014.04.024     Document Type: Article

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