High efficient antireflective down-conversion Y 2O 3:Bi,Yb films with pyramid preferred oriented nano-structure

Journal of Applied Physics

Volumn 111, Issue 9, 2012, Pages

  Qu, Ming Hao ^a   Wang, Ru Zhi ^a   Zhang, Ying ^a   Li, Kai Yu ^a   Yan, Hui ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTIVE; CHEMICAL ETCHING; CRYSTALLINE SI; DOWNCONVERSION; LIGHT-TRAPPING; MICRO-TEXTURED SURFACES; MINIMUM VALUE; NEAR-INFRARED EMISSIONS; OXYGEN PRESSURE; PLD PROCESS; PREFERENTIAL ORIENTATION; SI (100) SUBSTRATE; SMOOTH SURFACE; ULTRAVIOLET PHOTON;

BISMUTH; ENERGY EFFICIENCY; OXYGEN; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; REFLECTION; SILICON; SILICON SOLAR CELLS; YTTERBIUM;

NANOSTRUCTURES;

EID: 84864258456     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4712461     Document Type: Article

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