Transforming one-dimensional nanowalls to long-range ordered two-dimensional nanowaves: Exploiting buckling instability and nanofibers effect in holographic lithography

Advanced Functional Materials

Volumn 24, Issue 16, 2014, Pages 2361-2366

  Li, Jie ^a   Cho, Yigil ^a,b   Choi, In Suk ^b   Yang, Shu ^a  

^a UNIVERSITY OF PENNSYLVANIA   (United States)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

buckling; holographic lithography; long range order; nanofibers; nanowaves

Indexed keywords

ASPECT RATIO; FINITE ELEMENT METHOD; NANOFIBERS; PHOTORESISTS; TWO DIMENSIONAL;

BUCKLING INSTABILITIES; CRITICAL THRESHOLD; CROSS-LINKING DENSITY; DEVELOPMENT STAGES; HOLOGRAPHIC LITHOGRAPHY; LATERAL UNDULATION; LONG RANGE ORDERS; NANOWAVES;

BUCKLING;

EID: 84898786968     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201302826     Document Type: Article

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