Future prospects of MRAM technologies

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 2013, Pages

  Yuasa, S ^a,c   Fukushima, A ^a,c   Yakushiji, K ^a,c   Nozaki, T ^a,c   Konoto, M ^a,c   Maehara, H ^a,c   Kubota, H ^a,c   Taniguchi, T ^a   Arai, H ^a   Imamura, H ^a   Ando, K ^a   Shiota, Y ^b,c   Bonell, F ^b,c   Suzuki, Y ^b,c   Shimomura, N ^d   Kitagawa, E ^d   Ito, J ^d   Fujita, S ^d   Abe, K ^d   Nomura, K ^d   Noguchi, H ^d   Yoda, H ^d   more..

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^d TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84894386420     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.2013.6724549     Document Type: Conference Paper

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