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Journal of Materials Science: Materials in Electronics

Volumn 25, Issue 1, 2014, Pages 262-266

The influence of oxygen pressure on the growth of CuO nanostructures prepared by RF reactive magnetron sputtering

(5) Elfadill, Nezar G a Hashim, M R a Chahrour, Khaled M a Qaeed, M A a Wang, Chunsheng a

a SCHOOL OF PHYSICS (Malaysia)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHIC ORIENTATIONS; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; HETEROJUNCTION DIODES; INFLUENCE OF OXYGEN; IV CHARACTERISTICS; REACTIVE GAS MIXTURES; RF REACTIVE MAGNETRON SPUTTERING; STRUCTURAL AND OPTICAL PROPERTIES;

COPPER; FILM PREPARATION; HETEROJUNCTIONS; MAGNETRON SPUTTERING; MIXTURES; OXIDE FILMS; SEMICONDUCTOR DIODES; X RAY DIFFRACTION;

OXYGEN;

EID: 84893694259 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-013-1581-8 Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.