Thin film thickness and uniformity measurement for lab-on-chip based nanoelectrode biosensor development

Advanced Materials Research

Volumn 832, Issue , 2014, Pages 95-100

  Sharma Rao, B ^a   Hashim, U ^a   Adam, Tijjani ^a  

^a UNIVERSITY MALAYSIA PERLIS   (Malaysia)

Author keywords

Filmetrics spectrometer; LPCVD; Oxidation; Spectral reflectance; Thin Film

Indexed keywords

HIGH TEMPERATURE PROCESS; LAYER THICKNESS; LPCVD; SEMICONDUCTOR SUBSTRATE; SILICON SUBSTRATES; SPECTRAL REFLECTANCES; STANDARD DEVIATION; WET OXIDATION METHODS;

DEPOSITION; NANOSCIENCE; OXIDATION; SILICON NITRIDE; SILICON OXIDES; SILICON WAFERS; SURFACE DEFECTS; THIN FILMS;

FILM THICKNESS;

EID: 84891618603     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.832.95     Document Type: Conference Paper

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