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Volumn , Issue , 2008, Pages
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Mask design and fabrication of LiSFET for light sensor application
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Author keywords
[No Author keywords available]
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Indexed keywords
EXPOSURE SYSTEMS;
INTEGRATED CIRCUIT FABRICATIONS;
LIGHT SENSORS;
LITHOGRAPHY PROCESS;
MASK DESIGNS;
MOS FETS;
OPTICAL LITHOGRAPHIES;
PHOTOCONDUCTIVE MATERIALS;
IMAGE QUALITY;
INTEGRATED CIRCUITS;
LIGHT;
LIGHT SOURCES;
MOSFET DEVICES;
OPTOELECTRONIC DEVICES;
PHOTOLITHOGRAPHY;
SENSORS;
SILICON WAFERS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 63649140117
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ICED.2008.4786651 Document Type: Conference Paper |
Times cited : (4)
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References (11)
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