Chemical composition and temperature dependent performance of ZnO-thin film transistors deposited by pulsed and continuous spray pyrolysis

Journal of Applied Physics

Volumn 114, Issue 23, 2013, Pages

  Ortel, Marlis ^a   Balster, Torsten ^a   Wagner, Veit ^a  

^a JACOBS UNIVERSITY BREMEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; CHEMICAL COMPOSITIONS; CONTINUOUS DEPOSITION; DEPOSITION TEMPERATURES; DEVICE CHARACTERISTICS; ELECTRICAL PERFORMANCE; PULSED SPRAY PYROLYSIS; ZINC OXIDE THIN FILMS;

FLUID MECHANICS; OPTIMIZATION; OXYGEN; SPRAY PYROLYSIS; THIN FILM TRANSISTORS; THIN FILMS; ZINC; ZINC COMPOUNDS; ZINC OXIDE; ZINC SULFIDE;

DEPOSITION;

EID: 84891463478     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4846736     Document Type: Article

References (20)

1. M. Diaconu, " UV optical properties of ferromagnetic Mn-doped ZnO thin films grown by PLD.," Thin Solid Films 486, 117-121 (2005). 10.1016/j.tsf.2004.11.211
2. T. Kamiya, K. Nomura, and H. Hosono, " Present status of amorphous In-Ga-Zn-O thin-film transistors.," Sci. Technol. Adv. Mater. 11, 044305 (2010). 10.1088/1468-6996/11/4/044305
3. E. Fortunato, P. Barquinha, and R. Martins, " Oxide semiconductor thin-film transistors: A review of recent advances.," Adv. Mater. 24, 2945-2986 (2012). 10.1002/adma.201103228
4. A. Bashir, " High-performance zinc oxide transistors and circuits fabricated by spray pyrolysis in ambient atmosphere.," Adv. Mater. 21, 2226-2231 (2009). 10.1002/adma.200803584
5. H. Faber, B. Butz, C. Dieker, E. Spiecker, and M. Halik, " Fully patterned low-voltage transparent metal oxide transistors deposited solely by chemical spray pyrolysis.," Adv. Funct. Mater. 23, 2828-2834 (2013). 10.1002/adfm.201202334
6. G. Adamopoulos, A. Bashir, P. H. Wöbkenberg, D. D. C. Bradley, and T. D. Anthopoulos, " Electronic properties of ZnO field-effect transistors fabricated by spray pyrolysis in ambient air.," Appl. Phys. Lett. 95, 133507 (2009). 10.1063/1.3238466
7. G. Adamopoulos, " Structural and electrical characterization of ZnO films grown by spray pyrolysis and their application in thin-film transistors.," Adv. Funct. Mater. 21, 525-531 (2011). 10.1002/adfm. 201001089
8. H. Kohzu, M. Kuzuhara, and Y. Takayama, " Infrared rapid thermal annealing for GaAs device fabrication.," J. Appl. Phys. 54, 4998-5002 (1983). 10.1063/1.332767
9. Y.-H. Kim, " Flexible metal-oxide devices made by room-temperature photochemical activation of sol-gel films.," Nature 489, 128-132 (2012). 10.1038/nature11434
10. C.-J. Ko, Y.-K. Lin, and F.-C. Chen, " Microwave annealing of polymer photovoltaic devices.," Adv. Mater. 19, 3520-3523 (2007). 10.1002/adma.200700741
11. A. C. Jones and M. L. Hitchman, Chemical Vapour Deposition: Precursors, Processes and Applications (Royal Society of Chemistry, 2009), Vol. 7.
12. C. H. J. Van den Brekel and A. K. Jansen, " Morphological stability analysis in chemical vapour deposition processes. I.," J. Cryst. Growth 43, 364-370 (1978). 10.1016/0022-0248(78)90395-0
13. M. Ortel and V. Wagner, " Leidenfrost temperature related CVD-like growth mechanism in ZnO-TFTs deposited by pulsed spray pyrolysis.," J. Cryst. Growth 363, 185-189 (2013). 10.1016/j.jcrysgro.2012.10.043
14. M. Mohai, " XPS MultiQuant: Multimodel XPS quantification software.," Surf. Interface Anal. 36, 828-832 (2004). 10.1002/sia.1775
15. M. Futsuhara, K. Yoshioka, and O. Takai, " Optical properties of zinc oxynitride thin films.," Thin Solid Films 317, 322-325 (1998). 10.1016/S0040-6090(97)00646-9
16. C. Woell, " The chemistry and physics of zinc oxide surfaces.," Prog. Surf. Sci. 82, 55-120 (2007). 10.1016/j.progsurf.2006.12.002
17. G. L. Mar, P. Y. Timbrell, and R. N. Lamb, " Factors influencing the chemical vapor deposition of oriented ZnO films using zinc acetate.," Chem. Mater. 7, 1890-1896 (1995). 10.1021/cm00058a020
18. 2," Chin. Phys. Lett. 30, 027303 (2013). 10.1088/0256-307X/30/2/027303
19. V. Ischenko, " Zinc oxide nanoparticles with defects.," Adv. Funct. Mater. 15, 1945-1954 (2005). 10.1002/adfm.200500087
20. M. Miyasaka and J. Stoemenos, " Excimer laser annealing of amorphous and solid-phase-crystallized silicon films.," J. Appl. Phys. 86, 5556 (1999). 10.1063/1.371560