Remote plasma chemical vapor deposition for high-efficiency ultra-thin ∼25-microns crystalline Si solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue PART 2, 2012, Pages

  Sarkar, D ^a   Onyegam, E U ^b   Saha, S ^c   Mathew, L ^c   Rao, R A ^c   Hilali, M M ^b   Smith, R S ^c   Xu, D ^b   Jawarani, D ^c   Garcia, R ^b   Stout, R ^c   Gurmu, A ^c   Ainom, M ^c   Fossum, J G ^a   Banerjee, S K ^b  

^a UNIVERSITY OF FLORIDA   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c AstroWatt Inc   (United States)

Author keywords

Amorphous silicon; heterojunctions; photovoltaic cells; remote plasma CVD; solar cells; thin silicon

Indexed keywords

CRYSTALLINE SI SOLAR CELLS; CRYSTALLINE SILICONS; DEPOSITION TEMPERATURES; HETEROJUNCTION SOLAR CELLS; REMOTE PLASMA CHEMICAL VAPOR DEPOSITIONS; REMOTE PLASMA CVD; SILICON HETEROJUNCTIONS; SURFACE DAMAGES;

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; DEPOSITION; HETEROJUNCTIONS; OPEN CIRCUIT VOLTAGE; PASSIVATION; PHOTOVOLTAIC CELLS; PLASMA CVD; SILICON; SILICON SOLAR CELLS; SOLAR CELLS; STRUCTURAL OPTIMIZATION; VAPORS;

SEMICONDUCTING SILICON;

EID: 84891061782     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC-Vol2.2013.6656713     Document Type: Conference Paper

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