Structures, electrical and optical properties of nickel oxide films by radio frequency magnetron sputtering

Vacuum

Volumn 103, Issue , 2014, Pages 14-16

  Zhao, Y ^a   Wang, H ^b   Wu, C ^a   Shi, Z F ^a   Gao, F B ^a   Li, W C ^a   Wu, G G ^a   Zhang, B L ^a   Du, G T ^a,c  

^a JILIN UNIVERSITY   (China)

^b HENAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^c DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Electrical properties; Magnetron sputtering; Nickel oxide; Oxygen partial pressures

Indexed keywords

CRYSTAL QUALITIES; ELECTRICAL AND OPTICAL PROPERTIES; HALL SYSTEMS; NIO FILMS; OXYGEN PARTIAL PRESSURE; PREFERRED ORIENTATIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; ROOM TEMPERATURE;

MAGNETRON SPUTTERING; NICKEL OXIDE; OPTICAL PROPERTIES; OXIDE FILMS; PARTIAL PRESSURE; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ELECTRIC PROPERTIES;

EID: 84890491125     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2013.11.009     Document Type: Article

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