Low-loss titanium dioxide strip waveguides fabricated by atomic layer deposition

Journal of Lightwave Technology

Volumn 32, Issue 2, 2014, Pages 208-212

  Hayrinen, Markus ^a   Roussey, Matthieu ^a   Gandhi, Vishal ^a   Stenberg, Petri ^a   Saynatjoki, Antti ^b   Karvonen, Lasse ^b   Kuittinen, Markku ^a   Honkanen, Seppo ^a  

^a UNIVERSITY OF EASTERN FINLAND   (Finland)

^b AALTO UNIVERSITY   (Finland)

Author keywords

Deposition and fabrication; Nanostructure fabrication; Waveguides

Indexed keywords

DEPOSITION AND FABRICATION; LITHOGRAPHY PROCESS; NANOSTRUCTURE FABRICATION; PROPAGATION LOSS; REDEPOSITION; SIDEWALL ROUGHNESS; STRIP WAVEGUIDES; SUB-WAVELENGTH;

DEPOSITION; ELECTRIC LOSSES; ELECTRON BEAM LITHOGRAPHY; FABRICATION; OXIDES; TITANIUM DIOXIDE; WAVEGUIDES;

ATOMIC LAYER DEPOSITION;

EID: 84890483797     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2013.2291960     Document Type: Article

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