Nonequilibrium atmospheric pressure plasma jet using a combination of 50 kHz/2 MHz dual-frequency power sources

Physics of Plasmas

Volumn 20, Issue 11, 2013, Pages

  Zhou, Yong Jie ^a   Yuan, Qiang Hua ^a   Li, Fei ^a   Wang, Xiao Min ^a   Yin, Gui Qin ^a   Dong, Chen Zhong ^a  

^a NORTHWEST NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA JETS; ATMOSPHERIC PRESSURE PLASMAS; DUAL-FREQUENCY EXCITATION; FREQUENCY EXCITATION; HIGH-ELECTRON-DENSITY; LOW TEMPERATURE PLASMAS; NONEQUILIBRIUM ATMOSPHERIC PRESSURE PLASMA; RADIO FREQUENCY PLASMA;

IGNITION; RADIO WAVES;

PLASMA JETS;

EID: 84889017312     PISSN: 1070664X     EISSN: 10897674     Source Type: Journal    
DOI: 10.1063/1.4828720     Document Type: Article

References (46)

1. S. Dduarte, S. P. Kuo, R. M. Murata, C. Y. Chen, D. Saxena, K. J. Huang, and S. Popovic, Phys. Plasmas 18, 073503 (2011). 10.1063/1.3606486
2. G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, and A. Fridman, Plasma Processes Polym. 5, 503 (2008). 10.1002/ppap.200700154
3. A. Shashurin, M. Keidar, S. Bronnikov, R. A. Jurjus, and M. A. Stepp, Appl. Phys. Lett. 93, 181501 (2008). 10.1063/1.3020223
4. S. E. Babayan, J. Y. Jeong, A. Sc Utze, V. J. Tu, Maryam Moravej, G. S. Selwyn, and R. F. Hicks, Plasma Sources Sci. Technol. 10, 573 (2001). 10.1088/0963-0252/10/4/305
5. Q. Chen, Y. F. Zhang, E. L. Han, and Y. J. Ge, Plasma Sources Sci. Technol. 14, 670 (2005). 10.1088/0963-0252/14/4/005
6. P. Chu, IEEE Trans. Plasma Sci. 35, 181 (2007). 10.1109/TPS.2006.888587
7. Q. J. Cheng, S. Xu, J. Long, and K. Ostrikov, Appl. Phys. Lett. 90, 173112 (2007). 10.1063/1.2731728
8. Z. Xiong, X. P. Lu, A. Feng, Y. Pan, and K. Ostrikov, Phys. Plasmas 17, 123502 (2010). 10.1063/1.3526678
9. J. Huang, W. Chen, H. Li, X. Q. Wang, G. H. Lv, and M. L. Khosa, J. Appl. Phys. 109, 053305 (2011). 10.1063/1.3553873
10. K. Niemi, S. Reuter, L. M. Graham, J. Waskoenig, and T. Gans, Appl. Phys. Lett. 95, 151504 (2009). 10.1063/1.3242382
11. J. Shen, C. Cheng, S. D. Fang, H. B. Xie, Y. Lan, G. H. Ni, Y. D. Meng, J. R. Luo, and X. K. Wang, Appl. Phys. Express 5, 036201 (2012). 10.1143/APEX.5.036201
12. J. Y. Kim, D. H. Lee, J. Ballato, W. G. Cao, and S. O. Kim, Appl. Phys. Lett. 101, 224101 (2012). 10.1063/1.4768922
13. X. C. Li, Y. Y. Chang, P. Y. Jia, L. F. Xu, T. Z. Fang, and L. Wang, Phys. Plasmas 19, 093504 (2012). 10.1063/1.4752751
14. X. P. Lu, Z. H. Jiang, Q. Xiong, Z. Y. Tang, and Y. Pan, Appl. Phys. Lett. 92, 151504 (2008). 10.1063/1.2912524
15. H. Kim, A. Brockhaus, and J. Engemann, Appl. Phys. Lett. 95, 211501 (2009). 10.1063/1.3267142
16. J. Y. Jeong, S. E. Babayan, V. J. Tu, J. Park, I. Henins, R. F. Hicks, and G. S. Selwyn, Plasma Sources Sci. Technol 7, 282 (1998). 10.1088/0963-0252/7/3/005
17. E. Tatarova, F. M. Dias, E. Felizardo, J. Henriques, M. J. Pinheiro, C. M. Ferreira, and B. Gordiets, J. Appl. Phys. 108, 123305 (2010). 10.1063/1.3525245
18. X. Lu, S. Wu, P. K. Chu, D. Liu, and Y. Pan, Plasma Sources Sci. Technol. 20, 065009 (2011). 10.1088/0963-0252/20/6/065009
19. D. B. Kim, H. Jung, B. Gweon, S. Y. Moon, J. K. Rhee, and W. Choe, Phys. Plasmas 18, 043503 (2011). 10.1063/1.3574256
20. D. B. Kim, J. K. Rhee, B. Gweon, S. Y. Moon, and W. Choe, Appl. Phys. Lett. 91, 151502 (2007). 10.1063/1.2794774
21. P. C. Boyle, A. R. Ellingboe, and M. M. Turner, J. Phys. D: Appl. Phys. 37, 697 (2004). 10.1088/0022-3727/37/5/008
22. W. Tsai, G. Mueller, R. Lindquist, B. Frazier, and V. Vahedi, J. Vac. Sci. Technol. B 14, 3276 (1996). 10.1116/1.588820
23. E. Cianci, A. Schina, A. Minotti, S. Quaresima, and V. Foglietti, Sens. Actuators, A 127, 80 (2006). 10.1016/j.sna.2005.11.053
24. C. O'Neill, J. Waskoenig, and T. Gans, Appl. Phys. Lett. 101, 154107 (2012). 10.1063/1.4758463
25. J. Waskoenig and T. Gans, Appl. Phys. Lett. 96, 181501 (2010). 10.1063/1.3425668
26. D. B. Kim, S. Y. Moon, H. Jung, B. Gweon, and W. Choe, Phys. Plasmas 17, 053508 (2010). 10.1063/1.3430636
27. Z. Cao, Q. Y. Nie, and M. G. Kong, J. Phys. D: Appl. Phys. 42, 222003 (2009). 10.1088/0022-3727/42/22/222003
28. J. L. Walsh and M. G. Kong, Appl. Phys. Lett. 93, 111501 (2008). 10.1063/1.2982497
29. F. Massines, A. Rabehi, P. Decomps, R. B. Gadri, P. Segur, and C. Mayoux, J. Appl. Phys. 83, 2950 (1998). 10.1063/1.367051
30. P. S. Le, G. Li, S. Wang, H. P. Li, and C. Y. Bao, Appl. Phys. Lett. 95, 201501 (2009). 10.1063/1.3263153
31. J. J. Shi and M. G. Kong, Appl. Phys. Lett. 87, 201501 (2005). 10.1063/1.2128691
32. J. J. Shi and M. G. Kong, J. Appl. Phys. 97, 023306 (2005). 10.1063/1.1834978
33. J. J. Shi and M. G. Kong, Appl. Phys. Lett. 90, 111502 (2007). 10.1063/1.2713141
34. Y. J. Qian, K. Ding, S. T. Song, Y. Guo, J. Zhang, and J. J. Shi, Contrib. Plasma Phys. 52, 289 (2012). 10.1002/ctpp.201100109
35. S. Z. Li, Q. Wu, J. L. Zhang, D. Z. Wang, and H. S. Uhm, Phys. Plasmas 17, 063506 (2010). 10.1063/1.3447877
36. S. G. Belostotskiy, R. Khandelwal, Q. Wang, V. M. Donnelly, D. J. Economou, and N. Sadeghi, Appl. Phys. Lett. 92, 221507 (2008). 10.1063/1.2939437
37. J. J. Liu and M. G. Kong, J. Phys. D: Appl. Phys. 44, 345203 (2011). 10.1088/0022-3727/44/34/345203
38. J. A. M. van der Mullen, Phys. Rep. 191, 109 (1990). 10.1016/0370- 1573(90)90152-R
39. A. Sola, M. D. Calzada, and A. Gamero, J. Phys. D: Appl. Phys. 28, 1099 (1995). 10.1088/0022-3727/28/6/012
40. M. Y. Qian, C. S. Ren, D. Z. Wang, J. L. Zhang, and G. D. Wei, J. Appl. Phys. 107, 063303 (2010). 10.1063/1.3330717
41. Q. Y. Nie, C. S. Ren, D. Z. Wang, and J. L. Zhang, Appl. Phys. Lett. 93, 011503 (2008). 10.1063/1.2956411
42. M. A. Gigosos and V. Cardenoso, J. Phys. B 20, 6005 (1987). 10.1088/0022-3700/20/22/013
43. H. R. Griem, Plasma Spectroscopy (McGraw-Hill, New York, 1964).
44. H. R. Griem, Spectral Line Broadening by Plasma (Academic, New York, 1974).
45. R. Konjevic and N. Konjevic, Spectrochim. Acta, Part B 52, 2077 (1997). 10.1016/S0584-8547(97)00107-9
46. A. Yanguas-Gil, K. Focke, J. Benedikt, and A. von Keudell, J. Appl. Phys. 101, 103307 (2007). 10.1063/1.2714646