Radio-frequency dielectric-barrier glow discharges in atmospheric argon

Applied Physics Letters

Volumn 90, Issue 11, 2007, Pages

  Shi, J J ^a   Kong, M G ^a  

^a LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DIELECTRIC PROPERTIES; ELECTRODES; NATURAL FREQUENCIES; OPTICAL EMISSION SPECTROSCOPY;

ATMOSPHERIC ARGON; PLASMA CHEMISTRY; RADIO FREQUENCY DIELECTRIC BARRIER GLOW DISCHARGES; SURFACE PROCESSING;

GLOW DISCHARGES;

EID: 33947322188     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2713141     Document Type: Article

References (25)

1. U. Kogelschatz, Plasma Chem. Plasma Process. 23, 1 (2003).
2. J. G. Eden and S. J. Park, Phys. Plasmas 13, 057101 (2006).
3. For the industrial scale, see for example, http://www.apjet.com/services. html#prodscale
4. H. Shirai, T. Kobayashi, and Y. Hasegawa, Appl. Phys. Lett. 87, 143112 (2005).
5. M. Laroussi, IEEE Trans. Plasma Sci. 28, 184 (2000).
6. X. T. Deng, J. J. Shi, G. Shama, and M. G. Kong, Appl. Phys. Lett. 87, 153901 (2005).
7. Y. Takao and K. Ono, Plasma Sources Sci. Technol. 15, 211 (2006).
8. N. Gherardi and F. Massines, IEEE Trans. Plasma Sci. 29, 536 (2001).
9. J. Park, I. Henins, H. W. Herrmann, and G. S. Selwyn, J. Appl. Phys. 89, 15 (2001).
10. J. J. Shi and M. G. Kong, Appl. Phys. Lett. 87, 201501 (2005).
11. H. Yoshiki, A. Oki, H. Ogawa, and Y. Horiiki, Thin Solid Films 407, 156 (2002).
12. S. Wang, V. Schulz-von der Gathen, and H. F. Dobele, Appl. Phys. Lett. 83, 3272 (2003).
13. M. Moravej, X. Yang, R. F. Hicks, J. Penelon, and S. E. Babayan, J. Appl. Phys. 99, 093305 (2006).
14. H. B. Wang, W. T. Sun, H. P. Li, C. Y. Bao, X. Gao, and H. Y. Luo, Appl. Phys. Lett. 89, 161504 (2006).
15. K. H. Gericke, C. Gebner, and P. Scheffler, Vacuum 65, 291 (2002).
16. S. Y. Moon, J. W. Han, and W. Choe, Thin Solid Films 506-507, 355 (2006).
17. A. Rahman, A. P. Yalin, V. Surla, O. Stan, K. Hoshimiya, Z. Yu, E. Littlefield, and G. J. Collins, Plasma Sources Sci. Technol. 13, 537 (2004).
18. J. J. Shi, D. W. Liu, and M. G. Kong, Appl. Phys. Lett. 89, 081502 (2006).
19. J. J. Shi, D. W. Liu, and M. G. Kong, Appl. Phys. Lett. 90, 031505 (2007).
20. J. J. Shi and M. G. Kong, J. Appl. Phys. 97, 023306 (2005).
21. J. J. Shi and M. G. Kong, IEEE Trans. Plasma Sci. 33, 624 (2005).
22. S. Y. Moon, J. W. Han, and W. Choe, Phys. Plasmas 13, 013504 (2006).
23. J. J. Shi and M. G. Kong, Phys. Rev. Lett. 96, 105009 (2006).
24. J. J. Shi, X. T. Deng, R. Hall, J. D. Punnett, and M. G. Kong, J. Appl. Phys. 94, 6303 (2003).
25. J. Luque and D. R. Crosley, SRI International Report No. MP 99-009, 1999 (http://www.sri.com/psd/lifbase/).