SCOPUS 정보 검색 플랫폼

Volumn 5, Issue 3, 2012, Pages

Sterilization of bacillus subtilis spores using an atmospheric plasma jet with argon and oxygen mixture gas

(9) Shen, Jie a Cheng, Cheng a Fang, Shidong a Xie, Hongbing a Lan, Yan a Ni, Guohua a Meng, Yuedong a Luo, Jiarong a Wang, Xiangke a

a INSTITUTE OF PLASMA PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON GAS; ATMOSPHERIC PLASMAS; BACILLUS SUBTILIS SPORES; COLONY FORMING UNITS; DECIMAL REDUCTION; OXYGEN MIXTURES; REACTIVE OXYGEN; SHAPE CHANGE; UNDERLYING MECHANISM;

CHARGED PARTICLES; GASES; OZONE; PLASMA JETS; STERILIZATION (CLEANING); ULTRAVIOLET RADIATION;

ARGON;

EID: 84863349853 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.5.036201 Document Type: Article

Times cited : (60)

References (20)

1
- 0033731702
- C. Montie, K. Kelly-Wintenberg, and J. R. Roth: IEEE Trans. Plasma Sci. 28 (2000) 41.
- (2000) IEEE Trans. Plasma Sci. , vol.28 , pp. 41
- Montie, T.C.¹ Kelly-Wintenberg, K.² Roth, J.R.³

2
- 0001262417
- B. Gadri, J. R. Roth, T. C. Montie, K. Kelly-Wintenberg, P.-Y. P. Tsai, D. J. Helfritch, P. Feldman, D. M. Sherman, F. Karakaka, and Z. Chen: Surf. Coatings Technol. 131 (2000) 528.
- (2000) Surf. Coatings Technol. , vol.131 , pp. 528
- Gadri, R.B.¹ Roth, J.R.² Montie, T.C.³ Kelly-Wintenberg, K.⁴ Tsai, P.-Y.P.⁵ Helfritch, D.J.⁶ Feldman, P.⁷ Sherman, D.M.⁸ Karakaka, F.⁹ Chen, Z.¹⁰

3
- 34547254485
- H. S. Uhm, J. P. Lim, and S. Z. Li: Appl. Phys. Lett. 90 (2007) 261501.
- (2007) Appl. Phys. Lett. , vol.90 , pp. 261501
- Uhm, H.S.¹ Lim, J.P.² Li, S.Z.³

4
- 34848899476
- J. P. Lim, H. S. Uhm, and S. Z. Li: Phys. Plasmas 14 (2007) 093504.
- (2007) Phys. Plasmas , vol.14 , pp. 093504
- Lim, J.P.¹ Uhm, H.S.² Li, S.Z.³

5
- 67649135193
- A. Shashurin, M. N. Shneider, A. Dogariu, R. B. Miles, and M. Keidar: Appl. Phys. Lett. 94 (2009) 231504.
- (2009) Appl. Phys. Lett. , vol.94 , pp. 231504
- Shashurin, A.¹ Shneider, M.N.² Dogariu, A.³ Miles, R.B.⁴ Keidar, M.⁵

6
- 58349088805
- Z. Cao, J. L. Walsh, and M. G. Kong: Appl. Phys. Lett. 94 (2009) 021501.
- (2009) Appl. Phys. Lett. , vol.94 , pp. 021501
- Cao, Z.¹ Walsh, J.L.² Kong, M.G.³

7
- 55849133398
- A. Shashurin, M. Keidar, S. Bronnikov, R. A. Jurjus, and M. A. Stepp: Appl. Phys. Lett. 93 (2008) 181501.
- (2008) Appl. Phys. Lett. , vol.93 , pp. 181501
- Shashurin, A.¹ Keidar, M.² Bronnikov, S.³ Jurjus, R.A.⁴ Stepp, M.A.⁵

8
- 24944572288
- M. Laroussi and X. Lu: Appl. Phys. Lett. 87 (2005) 113902.
- (2005) Appl. Phys. Lett. , vol.87 , pp. 113902
- Laroussi, M.¹ Lu, X.²

9
- 40049093562
- X. Lu, Z. Jiang, Q. Xiong, Z. Tang, X. Hu, and Y. Pan: Appl. Phys. Lett. 92 (2008) 081502.
- (2008) Appl. Phys. Lett. , vol.92 , pp. 081502
- Lu, X.¹ Jiang, Z.² Xiong, Q.³ Tang, Z.⁴ Hu, X.⁵ Pan, Y.⁶

10
- 77952389578
- Q. Xiong, X. P. Lu, K. Ostrikov, Y. Xian, C. Zou, Z. Xiong, and Y. Pan: Phys. Plasmas 17 (2010) 043506.
- (2010) Phys. Plasmas , vol.17 , pp. 043506
- Xiong, Q.¹ Lu, X.P.² Ostrikov, K.³ Xian, Y.⁴ Zou, C.⁵ Xiong, Z.⁶ Pan, Y.⁷

11
- 0034249926
- J. Y. Jeong, J. Park, I. Hennis, S. E. Babayan, V. J. Yu, G. S. Selwyn, G. Ding, and R. F. Hicks: J. Phys. Chem. A 104 (2000) 8027.
- (2000) J. Phys. Chem. A , vol.104 , pp. 8027
- Jeong, J.Y.¹ Park, J.² Hennis, I.³ Babayan, S.E.⁴ Yu, V.J.⁵ Selwyn, G.S.⁶ Ding, G.⁷ Hicks, R.F.⁸

12
- 0344980605
- B. J. Park, D. H. Lee, J. C. Park, I. S. Lee, K. Y. Lee, S. O. Hyun, M. S. Chun, and K. H. Chung: Phys. Plasmas 10 (2003) 4539.
- (2003) Phys. Plasmas , vol.10 , pp. 4539
- Park, B.J.¹ Lee, D.H.² Park, J.C.³ Lee, I.S.⁴ Lee, K.Y.⁵ Hyun, S.O.⁶ Chun, M.S.⁷ Chung, K.H.⁸

13
- 33847103119
- S. Perni, G. Shama, J. L. Hobman, P. A. Lund, C. J. Kershaw, G. A. Hidalgo-Arroyo, C. W. Penn, X. Deng, J. L. Walsh, and M. G. Kong: Appl. Phys. Lett. 90 (2007) 073902.
- (2007) Appl. Phys. Lett. , vol.90 , pp. 073902
- Perni, S.¹ Shama, G.² Hobman, J.L.³ Lund, P.A.⁴ Kershaw, C.J.⁵ Hidalgo-Arroyo, G.A.⁶ Penn, C.W.⁷ Deng, X.⁸ Walsh, J.L.⁹ Kong, M.G.¹⁰

14
- 72049111528
- M. G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. van Dijk, and J. L. Zimmermann: New J. Phys. 11 (2009) 115012.
- (2009) New J. Phys. , vol.11 , pp. 115012
- Kong, M.G.¹ Kroesen, G.² Morfill, G.³ Nosenko, T.⁴ Shimizu, T.⁵ Van Dijk, J.⁶ Zimmermann, J.L.⁷

15
- 33747499516
- T. Sato, T. Miyahara, A. Doi, S. Ochiai, T. Urayama, and T. Nakatani: Appl. Phys. Lett. 89 (2006) 073902.
- (2006) Appl. Phys. Lett. , vol.89 , pp. 073902
- Sato, T.¹ Miyahara, T.² Doi, A.³ Ochiai, S.⁴ Urayama, T.⁵ Nakatani, T.⁶

16
- 33747848678
- X. T. Deng, J. J. Shi, and M. G. Kong: IEEE Trans. Plasma Sci. 34 (2006) 1310.
- (2006) IEEE Trans. Plasma Sci. , vol.34 , pp. 1310
- Deng, X.T.¹ Shi, J.J.² Kong, M.G.³

17
- 81155154008
- S. Iseki, H. Hashizume, F. Jia, K. Takeda, K. Ishikawa, T. Ohta, M. Ito, and M. Hori: Appl. Phys. Express 4 (2011) 116201.
- (2011) Appl. Phys. Express , vol.4 , pp. 116201
- Iseki, S.¹ Hashizume, H.² Jia, F.³ Takeda, K.⁴ Ishikawa, K.⁵ Ohta, T.⁶ Ito, M.⁷ Hori, M.⁸

18
- 77951232688
- S. Deng, C. Cheng, G. Ni, Y. Meng, and H. Chen: Curr. Appl. Phys. 10 (2010) 1164.
- (2010) Curr. Appl. Phys. , vol.10 , pp. 1164
- Deng, S.¹ Cheng, C.² Ni, G.³ Meng, Y.⁴ Chen, H.⁵

19
- 20844463749
- M. Nagatsu, F. Terashita, H. Nonaka, L. Xu, T. Nagata, and Y. Koide: Appl. Phys. Lett. 86 (2005) 211502.
- (2005) Appl. Phys. Lett. , vol.86 , pp. 211502
- Nagatsu, M.¹ Terashita, F.² Nonaka, H.³ Xu, L.⁴ Nagata, T.⁵ Koide, Y.⁶

20
- 79959653808
- Y. Zhao, A. Ogino, and M. Nagatsu: Appl. Phys. Lett. 98 (2011) 191501.
- (2011) Appl. Phys. Lett. , vol.98 , pp. 191501
- Zhao, Y.¹ Ogino, A.² Nagatsu, M.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.