Fermi-level tuning of topological insulator thin films

Japanese Journal of Applied Physics

Volumn 52, Issue 11 PART 1, 2013, Pages

  Aitani, Masaki ^a   Sakamoto, Yusuke ^a   Hirahara, Toru ^a   Yamada, Manabu ^a   Miyazaki, Hidetoshi ^b,c   Matsunami, Masaharu ^b   Kimura, Shin Ichi ^b,d   Hasegawa, Shuji ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

^c NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^d OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE RESOLVED PHOTOEMISSION SPECTROSCOPY; FILM CONDUCTIVITY; LOW ENERGY CONSUMPTION; NANOELECTRONIC DEVICES; RESIDUAL CARRIER; SUBSTRATE TEMPERATURE; TOPOLOGICAL INSULATORS; TRANSPORT MEASUREMENTS;

ELECTRIC INSULATORS; ELECTRONIC STRUCTURE; ENERGY UTILIZATION; FERMI LEVEL; INSULATING MATERIALS; LEAD; PHOTOELECTRON SPECTROSCOPY; PLASTIC FILMS; TRANSPORT PROPERTIES; ULTRATHIN FILMS;

FILM GROWTH;

EID: 84889004534     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.52.110112     Document Type: Article

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