The time-dependent process of oxidation of the surface of Bi2Te3 studied by x-ray photoelectron spectroscopy

Journal of Physics Condensed Matter

Volumn 12, Issue 26, 2000, Pages 5607-5616

  Bando, H ^a   Koizumi, K ^a   Oikawa, Y ^a   Daikohara, K ^a   Kulbachinskii, V A ^b   Ozaki, H ^a  

^a WASEDA UNIVERSITY   (Japan)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHEMICAL BONDS; MOLECULAR STRUCTURE; MULTILAYERS; OXIDATION; OXYGEN; SURFACES; THICKNESS MEASUREMENT; VAN DER WAALS FORCES; X RAY PHOTOELECTRON SPECTROSCOPY;

BISMUTH TELLURIDE; SINGLE OXIDIZED QUINTUPLE ATOMIC LAYER; VAN DER WAALS GAP;

BISMUTH COMPOUNDS;

EID: 0034225655     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/12/26/307     Document Type: Article

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