메뉴 건너뛰기




Volumn 38, Issue , 2013, Pages 642-648

Influence of hydrogenated passivation layers on the regeneration of boron-oxygen related defects

Author keywords

Boron Oxygen; Hydrogen; Regeneration; Silicon

Indexed keywords


EID: 84888314608     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2013.07.328     Document Type: Conference Paper
Times cited : (30)

References (9)
  • 1
    • 0015973475 scopus 로고
    • Investigation of photon and thermal induced changes in silicon solarcells
    • Palo Alto, CA
    • th IEEE PVSC, Palo Alto, CA, 1973; p. 404-411.
    • (1973) th IEEE PVSC , pp. 404-411
    • Fischer, H.1    Pschunder, W.2
  • 2
    • 41749088894 scopus 로고    scopus 로고
    • A new approach to prevent the negative impact of the meta-stable defect in boron doped cz silicon solar cells
    • Waikoloa, USA
    • th WCPEC), Waikoloa, USA 2006; p. 940-943.
    • (2006) th WCPEC) , pp. 940-943
    • Herguth, A.1    Schubert, G.2    Kaes, M.3    Hahn, H.4
  • 3
    • 79955040368 scopus 로고    scopus 로고
    • Hydrogenated silicon nitride for regeneration of light induced degradation
    • Hamburg, Germany
    • th EU-PVSEC, Hamburg, Germany, 2009; p. 1558-1561.
    • (2009) th EU-PVSEC , pp. 1558-1561
    • Münzer, K.A.1
  • 4
    • 80052082213 scopus 로고    scopus 로고
    • Impact of hydrogen concentration on the regeneration of light induced degradation
    • Krugel G, Wolke W, Geilker J., Rein S, Preu R. Impact of Hydrogen Concentration on the Regeneration of Light Induced Degradation. Energy Procedia 2011; 8: 47-51.
    • (2011) Energy Procedia , vol.8 , pp. 47-51
    • Krugel, G.1    Wolke, W.2    Geilker, J.3    Rein, S.4    Preu, R.5
  • 5
    • 0242497608 scopus 로고    scopus 로고
    • Influence of the high-temperature "firing" step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells
    • Hong F, Kessels WMM, Soppe WJ, Weeber AW. Influence of the high-temperature "firing" step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells. J. Vac. Sci. Tech. 2003; 21 5: 2123-2132.
    • (2003) J. Vac. Sci. Tech. , vol.21 , Issue.5 , pp. 2123-2132
    • Hong, F.1    Kessels, W.M.M.2    Soppe, W.J.3    Weeber, A.W.4
  • 7
    • 84898739543 scopus 로고    scopus 로고
    • van Erven AJM, Master Thesis, Eindhoven University of Technology; 2004
    • van Erven AJM, Master Thesis, Eindhoven University of Technology; 2004.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.