Manganese oxide thin films prepared by pulsed laser deposition for thin film microbatteries

Materials Chemistry and Physics

Volumn 143, Issue 2, 2014, Pages 720-727

  Xia, Hui ^a   Wan, Yunhai ^a   Yan, Feng ^b   Lu, Li ^c  

^a NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b Northwestern University   (United States)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Electrochemical properties; Electrochemical techniques; Physical vapor deposition; Thin films

Indexed keywords

AS-DEPOSITED THIN FILMS; ELECTROCHEMICAL PERFORMANCE; ELECTROCHEMICAL TECHNIQUES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; MORPHOLOGICAL FEATURES; OXYGEN PARTIAL PRESSURE; REVERSIBLE CAPACITY; THIN FILM MICROBATTERIES;

ELECTROCHEMICAL PROPERTIES; FIELD EMISSION MICROSCOPES; FILM PREPARATION; MANGANESE; MANGANESE OXIDE; OXIDATION; OXIDES; PARTIAL PRESSURE; PHOTOELECTRONS; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION;

EID: 84888204240     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2013.10.005     Document Type: Article

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