Study of manganese oxide thin films grown by pulsed laser deposition

Thin Solid Films

Volumn 517, Issue 5, 2009, Pages 1592-1595

  Isber, S ^a   Majdalani, E ^a   Tabbal, M ^a   Christidis, T ^a   Zahraman, K ^b   Nsouli, B ^b  

^a AMERICAN UNIVERSITY OF BEIRUT   (Lebanon)

^b NATIONAL COUNCIL FOR SCIENTIFIC RESEARCH   (Lebanon)

Author keywords

Manganese oxides; Morphology; Phase transformation; Pulsed laser deposition; Surface structure; X ray diffraction

Indexed keywords

DIFFRACTION; LASERS; MANGANESE; MANGANESE COMPOUNDS; OXIDE FILMS; OXYGEN; PHASE DIAGRAMS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SURFACE ROUGHNESS; SURFACE STRUCTURE; THICK FILMS; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION;

ATOMIC FORCES; DEPOSITION TEMPERATURES; GRAZING INCIDENCES; HIGHER TEMPERATURES; LOW DEPOSITION TEMPERATURES; MANGANESE OXIDES; OXYGEN PRESSURES; PHASE TRANSFORMATION; PHASE TRANSFORMATIONS; PULSED LASERS; SUBSTRATE TEMPERATURES; TEMPERATURE RANGES; TRANSITION TEMPERATURES; X-RAY DIFFRACTIONS;

OXIDES;

EID: 57049143117     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.09.097     Document Type: Article

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