Low-refractive-index and high-transmittance silicon oxide with a mixed phase of n-type microcrystalline silicon as intermediate reflector layers for tandem solar cells

Solar Energy Materials and Solar Cells

Volumn 121, Issue , 2014, Pages 1-7

  Jung, Seung Jae ^a   Kim, Byoung June ^a   Shin, Myunghun ^a,b  

^a Samsung SDI   (South Korea)

^b Hankuk Aviation University   (South Korea)

Author keywords

Mixed phase n type microcrystalline Si; Plasma enhanced chemical vapor deposition; Si thin film; SiOx; Tandem solar cell

Indexed keywords

HYDROGEN DILUTION RATIO; INTERMEDIATE REFLECTORS; LIGHT-INDUCED DEGRADATION; MICROCRYSTALLINE SI; OPTIMIZATION PROCEDURES; SIOX; STABILIZED EFFICIENCY; TANDEM SOLAR CELLS;

AMORPHOUS SILICON; EFFICIENCY; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFLECTION; SILICON; SILICON OXIDES; SOLAR CELLS; VAPORS;

REFRACTIVE INDEX;

EID: 84887853885     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2013.10.036     Document Type: Article

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